Ithusi likwazi ukumelana nokugqwala okuhle kakhulu ezindaweni ezomile, kodwa lijwayele ukwenza i-patina endaweni-enomswakama noma isibabule{{1}eliphezulu{1}eliqukethe igesi, okuholela ekwenyukeni kokumelana nokuthintana. Ingaphezulu le-aluminium lithambekele ekwenzeni ifilimu ye-oxide eminyene, engavimbela ukugqwala okuqhubekayo. Kodwa-ke, ukumelana kwefilimu ye-oxide (cishe 10⁻⁶Ω·cm²) kuphakeme kakhulu kunalokho kwe-copper substrate (10⁻⁶Ω·cm²), futhi idinga ukuthuthukiswa ngokusebenzisa i-tin plating, i-nickel plating noma ukwelashwa kwe-anodic oxidation.
Ngokuphathelene nomthelela wokushisa ku-conductivity kagesi, i-coefficient yokushisa yokumelana nethusi (0.0043 / degree) iphansi kune-aluminium (0.0041 / degree), kodwa i-coefficient yokwanda okushisayo kwe-aluminium (23.6 × 10⁻⁶/ degree) yi-1.4 izikhathi ze-5.⁶ ⁶ (1⁶ degree) ⁶ 1/6 (1/6). Ezimeni ezinokuguquguquka okuphawulekayo kwezinga lokushisa, ukunwetshwa okushisayo nokufinyezwa kwamabha e-aluminium kugqama kakhulu, okungase kubangele ukuxega ezindaweni zokuxhuma. Lokhu kungancishiswa ngokuklama kwesakhiwo (njengokugcina izikhala zokunwetshwa) noma ngokusebenzisa izixhumi eziguquguqukayo.